Other

Neil E Hanson

Michael S Barnes

John Patrick Holland

Dan Maydan

Ashok K Sinha

Diana Xiaobing Ma

Bryan Y Pu

Michael D Armacost

Hongqing Shan

Zhifeng Sui

Mohit Kumar Jain

A substrate processing apparatus has a chamber having a substrate support, gas distributor, gas energizer, and gas exhaust port. A process monitor is provided to monitor features in a first region of the substrate and generate a corresponding first signal, and to monitor features in a second region of the substrate and generate a second signal. A chamber controller receives and evaluates the first and second signals, and operates the chamber in relation to the signals. For example, the chamber controller can select a process recipe depending upon the signal values. The chamber controller can also set a process parameter at a first level in a first processing sector and at a second level in a second processing sector. The apparatus provides a closed control loop to independently monitor and control processing of features at different regions of the substrate.

Monitoring dimensions of features at different locations in the processing of substrates

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Santa Clara, CA, United States of America

Neil E Hanson