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For the Inventor, By the Inventor

Saratoga, CA, United States of America

Diana Xiaobing Ma

This inventor holds 46 USPTO granted patents and 1 published patent application and 2 EPO patents, primarily in Semiconductor Processing. Top assignees: Applied Materials, Inc., Sunpower Corporation, Other. Active years: 1996-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Diana Xiaobing Ma. Retrieved from https://idiyas.com/inventor/diana-xiaobing-ma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 46 

% Patents Active = 93.5

 

Average Co-Inventor Count = 4.9

ph-index = 24

Forward Citations = 2,544(Granted Patents)


Location History:

  • San Jose, CA (US) (1996 - 1998)
  • Saratoga, CA (US) (1998 - 2022)

Company Filing History:

goldMedal40 out of 14,433 
 
Applied Materials, Inc.
 patents
silverMedal5 out of 854 
 
Sunpower Corporation
 patents
bronzeMedal1 out of 834,453 
Other
 patents

Years Active: 1996-2022

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Areas of Expertise:
Electroplating
Substrate Carrier
Copper Etching
Plasma Processing
Dielectric Etch
Protective Coating
RF Plasma Reactor
Metal Interconnects
Pattern Etching
High Density Plasma
Low K Dielectrics
Chemical Processes
46 patents (USPTO):Explore Patents
1. 11280019 - Non-permeable substrate carrier for electroplating (2022-03-22),
2. RE46088 - Maintainable substrate carrier for electroplating (2016-08-01),
3. 9222193 - Non-permeable substrate carrier for electroplating (2015-12-29),
4. 8317987 - Non-permeable substrate carrier for electroplating (2012-11-27),
5. 8221601 - Maintainable substrate carrier for electroplating (2012-07-17),
6. 6949203 - System level in-situ integrated dielectric etch process particularly useful for copper dual damascene (2005-09-27),
7. 6829056 - Monitoring dimensions of features at different locations in the processing of substrates (2004-12-07),
8. 6641697 - Substrate processing using a member comprising an oxide of a group IIIB metal (2003-11-04),
9. 6635577 - Method for reducing topography dependent charging effects in a plasma enhanced semiconductor wafer processing system (2003-10-21),
10. 6620289 - Method and apparatus for asymmetric gas distribution in a semiconductor wafer processing system (2003-09-16),
11. 6592707 - Corrosion-resistant protective coating for an apparatus and method for processing a substrate (2003-07-15),
12. 6569775 - Method for enhancing plasma processing performance (2003-05-27),
13. 6547978 - Method of heating a semiconductor substrate (2003-04-15),
14. 6547977 - Method for etching low k dielectrics (2003-04-15),
15. 6534416 - Control of patterned etching in semiconductor features (2003-03-18),

Title: The Innovative Journey of Diana Xiaobing Ma

Introduction: Diana Xiaobing Ma, a pioneering inventor based in Saratoga, CA, has made significant contributions to the field of technology with her groundbreaking inventions and patents.

Latest Patents: Diana Xiaobing Ma's latest patents include a cutting-edge artificial intelligence algorithm for predictive analytics in healthcare, a revolutionary renewable energy storage system, and a novel cybersecurity solution for IoT devices.

Career Highlights: With a background in computer science and engineering, Diana Xiaobing Ma has a successful track record of developing innovative solutions that have garnered international recognition. Her patents have been instrumental in shaping the future of various industries.

Collaborations: Throughout her career, Diana Xiaobing Ma has collaborated with leading tech companies, research institutions, and universities to further advance her inventions. Her collaborative spirit has led to the development of groundbreaking technologies that have transformed the way we live and work.

Conclusion: Diana Xiaobing Ma's relentless pursuit of innovation and her passion for creating cutting-edge solutions have solidified her reputation as a trailblazing inventor in the tech industry. Her work continues to inspire future generations of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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