The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2004
Filed:
May. 08, 2003
Karl-Heinz Schuster, Koenigsbronn, DE;
Wilhelm Ulrich, Aalen, DE;
Toralf Gruner, Koenigsbronn, DE;
Daniel Kraehmer, Oberkochen, DE;
Wolfgang Singer, Aalen, DE;
Alexander Epple, Aalen, DE;
Helmut Beierl, Heidenheim an der Brenz, DE;
Reiner Garreis, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.