The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2004
Filed:
Jul. 23, 2002
Arno Jan Bleeker, Westerhoven, NL;
Pieter Willem Herman De Jager, Rotterdam, NL;
Jason Douglas Hintersteiner, Bethel, CT (US);
Borgert Kruizinga, Zoetermer, NL;
Matthew Eugene McCarthy, Brookfield, CT (US);
Mark Oskotsky, Mamaroneck, NY (US);
Lev Ryzhikov, Norwalk, CT (US);
Lev Sakin, Stamford I, CT (US);
Stanislav Smirnov, Bethel, CT (US);
Bart Snijders, Rotterdam, NL;
Karel Diederick Van Der Mast, Helmond, NL;
Huibert Visser, Zevenhuizen, NL;
ASML Netherlands B.V., , NL;
Abstract
An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.