The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2004

Filed:

Apr. 10, 2003
Applicant:
Inventors:

Heng-Sheng Huang, Taipei, TW;

Gary Hong, Hsin-Chu, TW;

Shih-Chieh Lin, Taipei Hsien, TW;

Yueh-Hsun Lee, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 3/126 ;
U.S. Cl.
CPC ...
G01R 3/126 ;
Abstract

A first compensation factor, a second compensation factor and a third compensation factor are provided to improve a capacitance-voltage (C-V) method for measuring an effective channel length of a metal-oxide-semiconductor field effect transistor (MOSFET), and an overlap length of a gate and a source and a drain of the transistor. The first compensation factor is calculated by measuring two unit length gate capacitances of the transistor. The second compensation factor is calculated by measuring two unit length overlap capacitances of the transistor. The third compensation factor is a ratio of the second compensation factor to the first compensation factor.


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