Company Filing History:
Years Active: 2004
Title: The Innovative Mind of Shih-Chieh Lin
Introduction
Shih-Chieh Lin, based in Taipei Hsien, Taiwan, is an accomplished inventor with a notable contribution to the field of electronics. His innovative thinking has led to the development of a unique method for measuring the effective channel length of a metal-oxide-semiconductor field effect transistor (MOSFET). With his expertise, he contributes significantly to advancements in semiconductor technology.
Latest Patents
Shih-Chieh Lin holds a patent titled "Method for measuring an effective channel length of a MOSFET." This innovative method involves the use of three compensation factors designed to enhance the capacitance-voltage (C-V) approach used for measuring an effective channel length. The first compensation factor arises from measurements of two unit length gate capacitances of the transistor. The second is derived from two unit length overlap capacitances. The third compensation factor is a ratio of the second to the first compensation factor. This methodology improves the accuracy of measurements of both the effective channel length and the overlap length of the gate with the source and drain of the transistor.
Career Highlights
Shih-Chieh Lin currently works at United Microelectronics Corporation, a prominent player in the semiconductor industry. His role involves engaging with cutting-edge technologies and contributing to the company’s innovative projects. His patent underscores his commitment to advancing the field of MOSFET technology, which remains critical in modern electronics.
Collaborations
Throughout his career, Shih-Chieh Lin has collaborated with skilled professionals in his field, including Heng-Sheng Huang and Gary Y Hong. These collaborations leverage their varied expertise and contribute to the successful development of breakthrough technologies in semiconductor design and application.
Conclusion
Shih-Chieh Lin exemplifies the spirit of innovation through his work on measuring effective channel lengths in MOSFETs. His patent not only reflects his individual brilliance but also highlights the collaborative efforts in the semiconductor industry. As technology continues to evolve, the contributions of inventors like Shih-Chieh Lin remain vital to pushing the boundaries of what is possible.