The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
May. 30, 2002
Applicant:
Inventors:
Heine Melle Mulder, Eindhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Markus Franciscus Antonius Eurlings, Breda, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Marcel Dierichs, Venlo, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/186 ;
U.S. Cl.
CPC ...
G01N 2/186 ;
Abstract
A lithographic projection system has an illumination system. A plurality of directing elements reflect different sub-beams of an incident projection beam into adjustable, individually controllable directions. By using of re-directing optics any desired spatial intensity distribution of the projection beam can be produced in its cross-sectional plane.