The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Nov. 09, 2001
Masanao Hotta, Tokyo, JP;
Yasuhiko Kojima, Tokyo, JP;
Takaomi Ito, Tokyo, JP;
Katsumi Yokota, Tokyo, JP;
Tetsuyuki Okabayashi, Tokyo, JP;
Akio Otani, Tokyo, JP;
Susumu Ono, Tokyo, JP;
Elionix Inc., Tokyo, JP;
Abstract
In an electron beam lithography system, an outputted main signal is applied directly to deflection plates, whereas an outputted auxiliary signal is applied to the deflection plate through a capacitive coupling for writing a wide strip-like pattern accurately at a high speed. In the electron beam lithography system, a deflection signal is divided into a main signal having a low frequency and a large amplitude and an auxiliary signal having a high frequency and a small amplitude. The main signal is applied directly to deflection plates, and the auxiliary signal is applied to the deflection plate through a capacitor. In the case of writing a straight line having a certain width, and a solid graphic pattern, because the electron beam is deflected in a given direction and a given width by the use of the auxiliary signal in synchronism with one sweeping cycle based on the main signal, a line whose width is as wide as may times of the electron beam diameter can be written, and a graphic pattern having a certain width can be written at a high speed.