Tokyo, Japan

Yasuhiko Kojima

This inventor holds 1 USPTO granted patent. Top assignee: Elionix Inc.. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhiko Kojima. Retrieved from https://idiyas.com/inventor/yasuhiko-kojima-eqd9ajcd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Yasuhiko Kojima: Innovator in Electron Beam Lithography

Introduction

Yasuhiko Kojima is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of electron beam lithography. His innovative work has led to advancements in high-speed pattern writing technology.

Latest Patents

Kojima holds a patent for an "Electron beam lithography system and method." This invention involves applying an outputted main signal directly to deflection plates, while an auxiliary signal is applied through capacitive coupling. This method allows for the accurate writing of wide strip-like patterns at high speeds. The system divides the deflection signal into a low-frequency, large-amplitude main signal and a high-frequency, small-amplitude auxiliary signal. This innovative approach enables the writing of lines and graphic patterns with widths significantly greater than the electron beam diameter.

Career Highlights

Kojima's career is marked by his role at Elionix Inc., where he has been instrumental in developing cutting-edge lithography systems. His expertise in electron beam technology has positioned him as a key figure in the industry.

Collaborations

Kojima has collaborated with notable colleagues, including Masanao Hotta and Takaomi Ito. Their combined efforts have contributed to advancements in electron beam lithography and related technologies.

Conclusion

Yasuhiko Kojima's innovative work in electron beam lithography has made a significant impact on the field. His patent and contributions continue to influence advancements in high-speed pattern writing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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