Tokyo, Japan

Masanao Hotta

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Elionix Inc., Office Tandem LLC. Active years: 2003-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masanao Hotta. Retrieved from https://idiyas.com/inventor/masanao-hotta

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0


Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2003-2017

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2 patents (USPTO):Explore Patents

Title: Masanao Hotta: Innovator in Mass Analysis and Lithography

Introduction

Masanao Hotta is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of mass analysis and electron beam lithography. With a total of 2 patents, his work showcases innovative approaches to complex technological challenges.

Latest Patents

One of Hotta's latest patents is the "Two rotating electric fields mass analyzer." This mass analyzer features two rotating electric field (REF) units, sinusoidal signal generators, and a means for separating dispersed ions. The REF units consist of elongated electrodes arranged around a central axis, lined in tandem. Sinusoidal signals are applied to these electrodes to create rotating electric fields. Ions enter the first REF unit, diverge outwards, and exit on off-axis positions. They then enter the second REF unit, where they converge inwards due to a 180-degree phase difference. This innovative design allows for the separation of specified mass ions from unspecified mass ions.

Another significant patent is the "Electron beam lithography system and method." In this system, a main signal is applied directly to deflection plates, while an auxiliary signal is applied through capacitive coupling. This design enables the accurate and high-speed writing of wide strip-like patterns. The deflection signal is divided into a low-frequency main signal and a high-frequency auxiliary signal. This allows for the creation of lines and graphic patterns with widths significantly larger than the electron beam diameter.

Career Highlights

Masanao Hotta has worked with notable companies such as Elionix Inc. and Office Tandem LLC. His experience in these organizations has contributed to his expertise in the fields of mass analysis and lithography.

Collaborations

Hotta has collaborated with esteemed colleagues, including Yasuhiko Kojima and Takaomi Ito. Their joint efforts have further advanced the technologies in which they specialize.

Conclusion

Masanao Hotta's innovative patents and career achievements highlight his significant contributions to technology. His work continues to influence the fields of mass analysis and electron beam lithography.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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