Susumu Ono

Title: The Innovative Contributions of Susumu Ono

Introduction

Susumu Ono is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly in electron beam lithography and ignition systems. With a total of 3 patents, Ono's work showcases his expertise and innovative spirit.

Latest Patents

One of Ono's latest patents is an electron beam lithography system and method. This system applies an outputted main signal directly to deflection plates, while an auxiliary signal is applied through capacitive coupling. This innovative approach allows for the accurate writing of wide strip-like patterns at high speeds. The division of the deflection signal into a main signal with low frequency and large amplitude, and an auxiliary signal with high frequency and small amplitude, enhances the system's efficiency.

Another significant patent is the overrun prevention ignition system with ignition angle retardation. This capacitor discharge type system includes an ignition angle retarding circuit that effectively lengthens the width of the ignition signal. By utilizing a supplemental ignition signal, the system ensures that a large retardation angle is achieved, preventing engine overrun.

Career Highlights

Throughout his career, Susumu Ono has worked with prominent companies such as Kioritz Corporation and Elionix Inc. His experience in these organizations has contributed to his development as an inventor and innovator in his field.

Collaborations

Ono has collaborated with notable individuals in the industry, including Tadasige Kondo and Kenichi Takata. These partnerships have likely enriched his work and expanded his impact on technology.

Conclusion

Susumu Ono's contributions to technology through his patents and collaborations highlight his innovative spirit and expertise. His work continues to influence advancements in electron beam lithography and ignition systems.