The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2003
Filed:
Jan. 04, 2000
Applicant:
Inventors:
Nathan W. Cheung, Albany, CA (US);
William G. En, Milpitas, CA (US);
Sharon N. Farrens, Davis, CA (US);
Mikhail Korolik, San Jose, CA (US);
Assignee:
Silicon Genesis Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/130 ; H01L 2/146 ;
U.S. Cl.
CPC ...
H01L 2/130 ; H01L 2/146 ;
Abstract
A method for forming a multi-layered substrate. The method includes forming a compliant layer on a face of a first substrate ( ). Joining the compliant layer against a face of a second substrate ( ), where the compliant layer forms around a surface non-uniformity on the second substrate face.
Quick Actions:
Cheung, Nathan. (2003). Method for fabricating multi-layered substrates (U.S. Patent No. 6534381). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6534381
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile