Company Filing History:
Years Active: 2001-2005
Title: Innovations by Sharon N Farrens
Introduction
Sharon N Farrens is a notable inventor based in Davis, CA, who has made significant contributions to the field of semiconductor technology. With a total of four patents to her name, she has developed innovative methods that enhance the bonding processes of semiconductor materials.
Latest Patents
One of her latest patents is the in situ plasma wafer bonding method. This method allows for the chemical bonding of semiconductor wafers and other materials without exposing them to wet environments. The bonding chamber designed for this process enables plasma activation and bonding to occur while maintaining the vacuum level. This eliminates the need for rinsing surfaces after placement in the chamber and accommodates variations in pressure, plasma gas species, and backfill gases. The resulting bonded materials are devoid of macroscopic and microscopic voids, and the initial bond strength surpasses that of conventional techniques. This advancement allows for the bonding of rougher materials, which can be utilized in various applications, including bond and etchback silicon on insulator, high voltage and current devices, radiation-resistant devices, micromachined sensors and actuators, and hybrid semiconductor applications. Notably, this technique is not limited to semiconductors; it can be applied to any material with sufficiently smooth surfaces that can endure vacuum and plasma environments.
Career Highlights
Sharon N Farrens is currently employed at Silicon Genesis Corporation, where she continues to innovate in the field of semiconductor technology. Her work has been instrumental in advancing the capabilities of semiconductor bonding techniques.
Collaborations
Some of her notable coworkers include Brian E Roberds and Nathan W Cheung, who contribute to the collaborative environment at Silicon Genesis Corporation.
Conclusion
Sharon N Farrens is a pioneering inventor whose work in plasma wafer bonding methods has the potential to revolutionize semiconductor applications. Her contributions reflect a commitment to innovation and excellence in technology.