The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2002
Filed:
Jun. 22, 2000
Karl A. Littau, Palo Alto, CA (US);
Bevan Vo, Santa Clara, CA (US);
Salvador P. Umotoy, Antioch, CA (US);
Son N. Trinh, Cupertino, CA (US);
Chien-Teh Kao, Sunnyvale, CA (US);
Ken Kaung Lai, Milpitas, CA (US);
Bo Zheng, San Jose, CA (US);
Ping Jian, San Jose, CA (US);
Siqing Lu, Sunnyvale, CA (US);
Anzhong Chang, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A showerhead for distributing gases in a semiconductor process chamber. In one embodiment, a showerhead comprising a perforated center portion, a mounting portion circumscribing the perforated center portion and a plurality of bosses extending from the mounting portion each having a hole disposed therethrough is provided. Another embodiment of the invention provides a showerhead that includes a mounting portion having a first side circumscribing a perforated center portion. A ring extends from the first side of the mounting portion. A plurality of mounting holes are disposed in the mounting portion radially to either side of the ring. The showerhead provides controlled thermal transfer between the showerhead and chamber lid resulting in less deposition on the showerhead.