The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2002
Filed:
Jul. 22, 2000
Erwin Gaber, Heidenheim, DE;
Christian Wagner, Aalen, DE;
Hubert Holderer, Königsbronn, DE;
Michael Gerhard, Aalen, DE;
Erich Merz, Essingen, DE;
Jochen Becker, Oberkochen, DE;
Arie Cornelis Scheiberlich, Veldhoven, NL;
Abstract
An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount ( ), and actuators ( ) which engage on the optical element ( ) at least approximately perpendicularly to the optical axis. The actuators ( ) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element ( ), for the production of bendings which take place substantially without thickness changes.