The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Dec. 03, 1999
Yoichi Ogawa, Ibaraki-ken, JP;
Tetsuo Mizumura, Ibaraki-ken, JP;
Akira Yano, Ibaraki-ken, JP;
Hideo Kusada, Kyoto, JP;
Takashi Kubota, Tsukuba, JP;
Michio Asano, Ibaraki-ken, JP;
Kunio Wakai, Ibaraki-ken, JP;
Hitachi Maxell, Ltd., Osaka, JP;
Abstract
A continuous plasma CVD apparatus, characterized in that frequency of high-frequency bias is in the range of 50-900 KHz, a blocking condenser is provided between a thin film and a high-frequency source so that the product C·f of electrostatic capacity C of the blocking condenser and frequency f of the high-frequency source is 0.02 [F·Hz] or more, and the total of impedances of all the rollers provided in the route of from a substrate unwind roller to a rotating drum is 10 k&OHgr; or more and the total of impedances of all the rollers provided in the route of from the rotating drum to a wind roller is 10 k&OHgr; or more. According to this apparatus, it becomes possible to continuously form a film without causing damage and deterioration of the substrate.