Ibaraki, Japan

Kunio Wakai


Average Co-Inventor Count = 3.6

ph-index = 7

Forward Citations = 144(Granted Patents)


Location History:

  • Kitasoma, JP (1991)
  • Ibaraki, JP (1988 - 1996)
  • Ibaraki-ken, JP (2000 - 2002)

Company Filing History:


Years Active: 1988-2002

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15 patents (USPTO):Explore Patents

Title: Kunio Wakai: A Pioneer in Plasma CVD Technology

Introduction

Kunio Wakai, an accomplished inventor based in Ibaraki, Japan, has made significant contributions to the field of plasma technology with a focus on continuous plasma chemical vapor deposition (CVD) apparatuses. With a remarkable portfolio of 15 patents, Wakai's inventions exhibit his commitment to advancing manufacturing processes and improving efficiency.

Latest Patents

Among his recent innovations, Wakai has developed a continuous plasma CVD apparatus characterized by specific engineering criteria. This apparatus operates within a frequency range of 50-900 KHz and incorporates a blocking condenser strategically placed between a thin film and a high-frequency source. The design ensures that the product of the electrostatic capacity (C) and frequency (f) of the high-frequency source is greater than or equal to 0.02 [F·Hz]. Additionally, the impedances of all rollers in the routes from substrate unwind roller to rotating drum, as well as from the rotating drum to wind roller, are designed to be 10 kΩ or more. With these innovative features, his apparatus enables the continuous formation of films without risking damage to the substrate, showcasing Wakai's dedication to improving production methods in the industry.

Career Highlights

Throughout his professional journey, Kunio Wakai has been associated with prominent companies that have shaped his expertise in technology. He has made significant contributions during his tenure at Hitachi Maxell, Limited and Hitachi Maxwell, Ltd., where he collaborated on various projects aimed at enhancing technological applications in manufacturing.

Collaborations

Wakai has worked alongside talented individuals, including colleagues Tetsuo Mizumura and Noboru Isoe. Their collective efforts have fostered a collaborative environment, driving innovation forward and contributing to the successful realization of Wakai's patented technologies.

Conclusion

Kunio Wakai stands out as a visionary inventor whose patents have propelled advancements in plasma deposition technology. His dedicated work ethic, collaborative spirit, and innovative approach to problem-solving continue to influence the field, ensuring that his legacy will inspire future generations of inventors and engineers.

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