Ibaraki-ken, Japan

Tetsuo Mizumura


Average Co-Inventor Count = 4.1

ph-index = 6

Forward Citations = 80(Granted Patents)


Location History:

  • Toride, JP (1989 - 1991)
  • Ibaraki, JP (1991)
  • Kitasouma-gun, JP (2000)
  • Ibaraki-ken, JP (1998 - 2002)

Company Filing History:


Years Active: 1989-2002

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10 patents (USPTO):Explore Patents

Title: Innovator Profile: Tetsuo Mizumura and His Contributions to Plasma CVD Technology

Introduction: Tetsuo Mizumura, an accomplished inventor based in Ibaraki-ken, Japan, has made significant strides in the field of technology with a robust portfolio of 10 patents. His innovative contributions, particularly in plasma chemical vapor deposition (CVD) technology, have positioned him as a notable figure in the industry.

Latest Patents: Among his notable inventions, Mizumura's latest patent is for a continuous plasma CVD apparatus. This device is characterized by a high-frequency bias range of 50-900 KHz, with a strategically placed blocking condenser that enhances the film formation process. The effective product of the electrostatic capacity of the blocking condenser and the high-frequency source frequency is set to a minimum of 0.02 [F·Hz]. Additionally, the apparatus maintains a total impedance of over 10 kΩ for all rollers in both the substrate unwind to rotating drum route and the rotating drum to wind roller route. This configuration allows for continuous film formation without causing damage or deterioration to the substrate, showcasing Mizumura's innovative engineering solutions.

Career Highlights: Tetsuo Mizumura has collaborated with prominent organizations, notably Hitachi Maxell, Limited, and Hitachi Maxwell, Ltd., where he honed his expertise and developed key technologies that contributed to his patent portfolio. His work in these industries reflects a commitment to advancing material processing technologies.

Collaborations: Throughout his career, Mizumura has partnered with talented professionals, including Kunio Wakai and Yoichi Ogawa. These collaborations have been instrumental in refining his ideas and advancing the application of plasma CVD technology.

Conclusion: Tetsuo Mizumura's contributions to the field of plasma CVD apparatus development are noteworthy. With a dedicated career spent enhancing technology that promotes efficient film formation, his work continues to impact the industry positively. As innovations evolve, Mizumura remains an inspiring example of how dedicated inventors can shape the future with their groundbreaking inventions.

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