Michio Asano

Title: Innovations of Michio Asano: Pioneering the Continuous Plasma CVD Apparatus

Introduction: Michio Asano, an influential inventor based in Ibaraki-ken, Japan, has made significant contributions to the field of plasma technology. With three patents to his name, Asano's innovations have paved the way for enhanced film production techniques without compromising substrate integrity. His dedication to advancing technology has positioned him as a recognized figure among inventors.

Latest Patents: Michio Asano’s latest patent is the "Plasma CVD apparatus," which features a continuous plasma chemical vapor deposition (CVD) system. This innovative apparatus operates with a high-frequency bias in the range of 50-900 KHz. It incorporates a blocking condenser strategically located between a thin film and a high-frequency source, ensuring that the product of the electrostatic capacity and frequency is 0.02 [F·Hz] or more. Furthermore, the system is engineered with rigorous impedance thresholds, where all rollers from the substrate unwind roller to the rotating drum must have a total impedance of 10 kΩ or more, as well as in the route from the rotating drum to the wind roller. This design enables a continuous film formation process that minimizes substrate damage and deterioration, showcasing Asano's innovative approach to material sciences.

Career Highlights: Throughout his career, Michio Asano has been associated with notable companies such as Hitachi Maxell, Limited and Hitachi Maxwell, Ltd. His work in these organizations has significantly influenced the development of advanced plasma technologies and equipment, facilitating breakthroughs in various applications.

Collaborations: Asano has collaborated with esteemed colleagues, including Yoichi Ogawa and Tetsuo Mizumura. Their joint efforts have contributed to various advancements in their field, enhancing the quality and efficiency of plasma deposition techniques.

Conclusion: Michio Asano is a prominent inventor whose work has substantially impacted the plasma technology landscape. Through his patents, particularly the innovative Plasma CVD apparatus, he has demonstrated an exceptional ability to solve complex challenges in film production. His collaborations and career with major corporations highlight the importance of teamwork in driving technological advancements. Asano's legacy as an inventor continues to inspire the next generation of innovators in the field.