Hideo Kusada

Title: Hideo Kusada: Innovator in Plasma CVD Technology

Introduction

Hideo Kusada is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of plasma chemical vapor deposition (CVD) technology. With a total of 3 patents to his name, Kusada's work has advanced the capabilities of continuous film formation processes.

Latest Patents

One of Kusada's latest patents is a continuous plasma CVD apparatus. This innovative apparatus is characterized by a high-frequency bias frequency range of 50-900 KHz. It includes a blocking condenser positioned between a thin film and a high-frequency source. The product of the electrostatic capacity of the blocking condenser and the frequency of the high-frequency source is designed to be 0.02 [F·Hz] or more. Additionally, the total impedances of all rollers in the route from the substrate unwind roller to the rotating drum is 10 kΩ or more, as well as from the rotating drum to the wind roller. This design allows for the continuous formation of films without causing damage or deterioration to the substrate.

Career Highlights

Kusada has worked with prominent companies such as Hitachi Maxell, Limited and Hitachi Maxwell, Ltd. His experience in these organizations has contributed to his expertise in the field of plasma technology.

Collaborations

Some of his notable coworkers include Yoichi Ogawa and Tetsuo Mizumura. Their collaboration has likely played a role in the development of innovative technologies in their respective fields.

Conclusion

Hideo Kusada's contributions to plasma CVD technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in film formation processes. His work continues to influence advancements in the industry.