The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2000
Filed:
Dec. 12, 1997
Applicant:
Inventors:
John Preston Benedict, New Paltz, NY (US);
David Mark Dobuzinsky, Hopewell Junction, NY (US);
Philip Lee Flaitz, Walden, NY (US);
Erwin N Hammerl, Emmerting, DE;
Herbert Ho, New Windsor, NY (US);
James F Moseman, Glenham, NY (US);
Herbert Palm, Hoehenkirchen, DE;
Seiko Yoshida, Yokohama, JP;
Hiroshi Takato, Wappingers Falls, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
257510 ; 257639 ; 257647 ; 257649 ;
Abstract
Disclosed is an improved process and liner for trench isolation which includes either a single oxynitride layer or a dual oxynitride (or oxide)/nitride layer. Such a process and liner has an improved process window as well as being an effective O.sub.2 diffusion barrier and resistant to hot phosphoric and hydrofluoric acids.