Company Filing History:
2 out of 164,271 
1 out of 30,066 
1 out of 52,778 
Years Active: 1998-2000
Title: Erwin N Hammerl: Innovator in Trench Isolation Technology
Introduction
Erwin N Hammerl is a notable inventor based in Emmerting, Germany. He has made significant contributions to the field of trench isolation technology, holding a total of 2 patents. His work has been instrumental in advancing processes that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
One of Hammerl's latest patents is focused on shallow trench isolation with an oxide-nitride/oxynitride liner. This patent discloses an improved process and liner for trench isolation, which includes either a single oxynitride layer or a dual oxynitride (or oxide)/nitride layer. The innovation boasts an improved process window and serves as an effective O₂ diffusion barrier, while also being resistant to hot phosphoric and hydrofluoric acids. This advancement is crucial for enhancing the reliability and performance of semiconductor devices.
Career Highlights
Throughout his career, Erwin N Hammerl has worked with prominent companies such as IBM and Siemens Aktiengesellschaft. His experience in these leading organizations has allowed him to develop and refine his innovative ideas in the field of semiconductor technology.
Collaborations
Hammerl has collaborated with notable professionals in his field, including John Preston Benedict and David M Dobuzinsky. These collaborations have contributed to the development of cutting-edge technologies and have furthered the impact of his inventions.
Conclusion
Erwin N Hammerl's contributions to trench isolation technology exemplify the importance of innovation in the semiconductor industry. His patents and collaborations reflect a commitment to advancing technology and improving manufacturing processes.