The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 1998

Filed:

Jan. 21, 1997
Applicant:
Inventors:

Junich Honma, Tokyo, JP;

Kotaro Mino, Himeji, JP;

Hisayuki Miyata, Ibo-gun, JP;

Haruhide Inoue, Himeji, JP;

Assignee:

Advanced Ceramics Corporation, Lakewood, OH (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02N / ;
U.S. Cl.
CPC ...
361234 ; 279128 ;
Abstract

An electrostatic chuck and method for electrostatically clamping a working member such as a semiconductor wafer to the chuck. The elcetrostatic chuck includes at least one conductive electrode and an insulating layer for separating the conductive electrode from the working member. The insulating layer is composed of a composition containing pyrolytic boron nitiride (PBN) and a carbon dopant in an amount above 0 wt % and less than about 3 wt % such that its electrical resistivity is smaller than 10.sup.14 .OMEGA.-cm. A source of voltage is impressed across the conductive electrode to generate an electrostatic field which causes the working member to be clamped to the chuck.


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