The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 1995
Filed:
Jul. 06, 1994
Meguru Kashida, Gunma, JP;
Toru Shirasaki, Gunma, JP;
Yuichi Hamada, Gunma, JP;
Yoshihiko Nagata, Gunma, JP;
Sakae Kawaguchi, Gunma, JP;
Yoshihiro Kubota, Gunma, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by coating the whole surface of the pellicle frame with a coating composition by the method of electrodeposition so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling.