Sakae Kawaguchi

Title: Sakae Kawaguchi: Innovator in Photomask Technology

Introduction

Sakae Kawaguchi is a notable inventor based in Gunma, Japan. He has made significant contributions to the field of photomask technology, particularly in the development of dustproof protection solutions for photomasks used in the manufacture of fine electronic parts and devices. With a total of 2 patents to his name, Kawaguchi's work has had a substantial impact on the industry.

Latest Patents

Kawaguchi's latest patents focus on improvements to frame-supported pellicles for dustproof protection of photomasks. The first patent proposes a design that includes a rigid frame and a transparent plastic membrane that is adhesively bonded to one end surface of the frame in a slack-free manner. This design is crucial for photolithographic patterning work. The improvement involves coating the entire surface of the pellicle frame with a coating composition through electrodeposition. This method effectively addresses the issue of dust particle deposition on the pellicle membrane during transportation and handling.

The second patent also addresses the same issue but introduces a different approach. It involves providing the entire surface of the pellicle frame, made from an aluminum alloy, with a metallic plating layer of nickel or chromium. This enhancement aims to eliminate dust particle deposition caused by contact with the inner surface of the holder case, thanks to the high smoothness of the metal-plated frame surface.

Career Highlights

Kawaguchi is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to innovate in the field of photomask technology. His work has been instrumental in advancing the quality and reliability of photomasks, which are essential in the production of electronic components.

Collaborations

Throughout his career, Kawaguchi has collaborated with several talented individuals, including Meguru Kashida and Toru Shirasaki. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Sakae Kawaguchi's contributions to photomask technology through his innovative patents demonstrate his commitment to solving industry challenges. His work continues to influence the manufacturing processes of fine electronic parts and devices, showcasing the importance of innovation in technology.