The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 1995
Filed:
Aug. 09, 1994
Sakae Kawaguchi, Gunma, JP;
Yuichi Hamada, Gunma, JP;
Toru Shirasaki, Gunma, JP;
Yoshihiko Nagata, Gunma, JP;
Meguru Kashida, Gunma, JP;
Yoshihiro Kubota, Gunma, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by providing the whole surface of the pellicle frame made from an alluminum alloy with a metallic plating layer of nickel or chromium so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling as a consequence of dust particle formation by contacting with the inner surface of the holder case by virtue of the extremely high smoothness of the metal-plated frame surface.