The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 1995
Filed:
Jun. 23, 1992
Applicant:
Inventors:
Johannes J Schmitz, Sunnyvale, CA (US);
Frederick J Scholz, Fremont, CA (US);
Norman L Turner, Gloucester, MA (US);
Raymond L Chow, Cupertino, CA (US);
Frank O Uher, Los Altos, CA (US);
Sien G Kang, Tracy, CA (US);
Steven C Selbrede, San Jose, CA (US);
Assignee:
Genus, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118728 ; 118715 ; 118725 ;
Abstract
Apparatus including a support and purge gas supply prevents edge and backside coating on a wafer in manufacture of integrated circuits. Various enclosure elements and methods are disclosed for containing and directing purge gas, and a CVD system is provided incorporating the elements of the invention.
Schmitz, Johannes. (1995). Purge gas in wafer coating area selection (U.S. Patent No. 5447570). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5447570
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile