Company Filing History:
Years Active: 1987-1995
Title: **Frederick J. Scholz: A Pioneer in Wafer Coating Technology**
Introduction
Frederick J. Scholz, an innovative inventor based in Fremont, CA, has contributed significantly to the field of semiconductor manufacturing. With a total of three patents to his name, his work has been instrumental in advancing the technology involved in wafer coating processes. His inventions focus on refining techniques that enhance the efficiency and effectiveness of integrated circuit fabrication.
Latest Patents
Frederick's recent patents showcase his ingenuity and expertise in the semiconductor industry. One notable invention is the **Purge Gas in Wafer Coating Area Selection**, which involves an apparatus designed to prevent edge and backside coating on wafers during manufacturing. This invention includes various enclosure elements and methods for containing and directing purge gas, alongside a Chemical Vapor Deposition (CVD) system that incorporates these innovative elements.
Another key patent by Frederick is the **Interchangeable CVD Chuck Surface**, which enhances the functionality of a chuck in a coating chamber of a CVD system. This invention features a hearth that provides heat to substrates and allows for an interchangeable chuck surface, which supports substrates during processing. Notably, it employs mechanisms to periodically remove excessive coatings on surfaces not intended for coating. The design also boasts an operable interlocking feature influenced by temperature, securing the chuck faces during operation and enabling easy interchangeability.
Career Highlights
Over the years, Frederick has made significant contributions while working at esteemed companies such as Genus, Inc. and Amitec, Inc. His experience at these organizations has fortified his understanding of semiconductor manufacturing processes and product development, allowing him to innovate and patent groundbreaking technologies.
Collaborations
Frederick has collaborated with notable professionals in his field, including Johannes J. Schmitz and Norman L. Turner. These collaborations have likely played a crucial role in the development of his patents and in fostering innovation within their respective projects.
Conclusion
Frederick J. Scholz stands out in the realm of semiconductor manufacturing due to his pioneering patents and collaborative efforts with industry experts. His inventiveness in wafer coating technologies not only enhances production efficiency but also contributes to the broader landscape of integrated circuit production. As he continues to innovate, his work remains influential in shaping the future of semiconductor technologies.