Company Filing History:
Years Active: 1993-1995
Title: Innovations by Johannes J. Schmitz in Wafer Coating Technologies
Introduction
Johannes J. Schmitz, based in Sunnyvale, California, is an innovative inventor known for his contributions to semiconductor manufacturing technologies. With a total of three patents to his name, Schmitz has focused primarily on enhancing the efficiency and accuracy of film deposition processes used in the creation of integrated circuits. His work is significant in the field of chemical vapor deposition (CVD) systems, which are essential for modern electronics.
Latest Patents
Schmitz's latest patents demonstrate his expertise in controlling film uniformity during the wafer coating process. The first patent, titled "Purge gas in wafer coating area selection," describes an apparatus designed to prevent unwanted coating on the edges and backside of wafers during manufacturing. This invention includes various enclosure elements that contain and direct purge gas effectively while incorporating the mechanisms needed for a robust CVD system.
The second patent, "Film uniformity by selective pressure gradient control," presents an innovative system for depositing film on substrates that utilizes a second-source injection subsystem for control gas. This invention allows for the adjustment of the deposition rate by altering the concentration of the control gas at the substrate surface, thereby enhancing the thickness uniformity of the film. Furthermore, this technique can be adapted for dry etching processes, controlling etching rates through the strategic application of reactive gas.
Career Highlights
Currently, Schmitz is employed at Genus, Inc., a company dedicated to advancing technologies in semiconductor manufacturing. His knowledge and creativity have significantly contributed to the company's development of state-of-the-art manufacturing processes. His patents not only reflect his innovative spirit but also highlight the practical applications of his inventions in real-world manufacturing settings.
Collaborations
Throughout his career, Schmitz has worked alongside esteemed colleagues such as Sien G. Kang and Raymond L. Chow. Their collaborative efforts in the field of semiconductor technology have facilitated breakthroughs that continue to influence the industry. Together, they have focused on enhancing the efficacy and reliability of manufacturing processes, ensuring that advancements keep pace with the demands of modern technology.
Conclusion
Johannes J. Schmitz’s work exemplifies the critical role that innovation plays in the semiconductor industry. His patents illustrate a deep understanding of the complexities involved in wafer manufacturing and underscore the importance of advancements in film deposition technologies. As Schmitz continues to explore new frontiers in his field, his contributions will undoubtedly further enhance the efficiency of integrated circuit production.