The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 1995
Filed:
Nov. 24, 1993
Katsuya Okumura, Poughkeepsie, NY (US);
Tohru Watanabe, Hopewell Junction, NY (US);
Riichirou Aoki, Kawasaki, JP;
Hiroyuki Yano, Wappingers Falls, NY (US);
Masako Kodera, Kawasaki, JP;
Atsushi Shigeta, Kawasaki, JP;
You Ishii, Tokyo, JP;
Norio Kimura, Tokyo, JP;
Masayoshi Hirose, Tokyo, JP;
Yukio Ikeda, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kanagawa, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A workpiece such as a semiconductor wafer is positioned between a turntable and a top ring and polished by an abrasive cloth on the turntable while the top ring is being pressed against the turntable. The top ring has a retaining ring for preventing the workpiece from deviating from the lower surface of the top ring, and the retaining ring has an inside diameter larger than an outside diameter of the workpiece. The rotation of the turntable imparts a pressing force in a direction parallel to the upper surface of the turntable to the workpiece so that an outer periphery of the workpiece contacts an inner periphery of the retaining ring, and the rotation of the retaining ring imparts a rotational force to the workpiece so that the workpiece performs a planetary motion relative to the top ring in the retaining ring.