The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1994
Filed:
May. 18, 1993
Kiyohisa Tateyama, Kumamoto, JP;
Michiaki Matsushita, Yatsushiro, JP;
Tokyo Electron Limited, Tokyo, JP;
Tokyo Electron Kyushu Limited, Tosu, JP;
Abstract
A substrate cleaning device comprising a motor for rotating a wafer together with a spin plate, claws for holding the wafer so as to form a space between the spin plate and the wafer, a jet nozzle through which cleaning solution is jetted onto an upper surface of the wafer, a rotating brush for brush-cleaning the upper surface of the wafer, a mechanism for blowing nitrogen gas or pure water onto the lower surface of the wafer, and a mechanism for exhausting the space between the spin plate and the wafer, wherein a solution passage for the solution blowing mechanism and an exhaust passage for the exhaust mechanism are formed in a drive shaft of the motor and communicated with the space.