The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 1988
Filed:
Mar. 19, 1985
Applicant:
Inventors:
Edward D Babich, Ridgefield, CT (US);
Michael Hatzakis, Chappaqua, NY (US);
Scott L Jacobs, Fishkill, NY (US);
Juri R Parasczcak, Pleasantville, NY (US);
Jane M Shaw, Ridgefield, CT (US);
David F Witman, Ossining, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; C08F / ; C08L / ;
U.S. Cl.
CPC ...
430313 ; 525 61 ; 525506 ; 525480 ; 525100 ; 525102 ; 525103 ; 156643 ;
Abstract
Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.