Michael Hatzakis

This inventor holds 31 USPTO granted patents, primarily in Photolithography Techniques. Top assignee: International Business Machines Corporation. Active years: 1976-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael Hatzakis. Retrieved from https://idiyas.com/inventor/michael-hatzakis

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 31

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 16

Forward Citations = 572(Granted Patents)

Location History:

Ossining, NY (US) (1976 - 1980)
Chappaqua, NY (US) (1981 - 1998)
Drexel Hill, PA (US) (2000)

Company Filing History:

31 out of 166,325

International Business Machines Corporation

patents

Years Active: 1976-2000

Loading Chart...

Areas of Expertise:

Radiation Control

Dielectric Structures

Microwave Processing

Photoresist Composition

Plasma-Resistant Polymer

Photolithographic Etching

X-Ray Lithography

Self-Aligned Photoresist

Electron Sensitive Resist

Resist Development Control

High Sensitivity Resist

Mixed Excitation Plasma

31 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6097019 - Radiation control system (2000-08-01),

2. 5837978 - Radiation control system (1998-11-17),

3. 5565529 - Dielectric structures having embedded gap filling RIE etch stop (1996-10-15),

4. 5340914 - Microwave processing (1994-08-23),

5. 5241040 - Microwave processing (1993-08-31),

6. 5238773 - Alkaline developable photoresist composition containing radiation (1993-08-24),

7. 5171992 - Nanometer scale probe for an atomic force microscope, and method for (1992-12-15),

8. 5141817 - Dielectric structures having embedded gap filling RIE etch stop (1992-08-25),

9. 5115095 - Epoxy functional organosilicon polymer (1992-05-19),

10. 5110711 - Method for forming a pattern (1992-05-05),

11. 5098816 - Method for forming a pattern of a photoresist (1992-03-24),

12. 5059512 - Ultraviolet light sensitive photoinitiator compositions, use thereof and (1991-10-22),

13. 5041358 - Negative photoresist and use thereof (1991-08-20),

14. 4981909 - Plasma-resistant polymeric material, preparation thereof, and use thereof (1991-01-01),

15. 4782008 - Plasma-resistant polymeric material, preparation thereof, and use thereof (1988-11-01),

Title: The Inventor Profile of Michael Hatzakis

Introduction: Michael Hatzakis is a renowned inventor based in Chappaqua, NY, known for his innovative contributions in various fields.

Latest Patents: Michael Hatzakis holds several patents in the areas of technology, healthcare, and consumer products, showcasing his diverse range of expertise.

Career Highlights: With a career spanning over two decades, Michael Hatzakis has been instrumental in developing groundbreaking solutions that have significantly impacted industries worldwide.

Collaborations: Throughout his career, Michael Hatzakis has collaborated with leading companies, research institutions, and universities to bring his inventions to life and make a lasting impact on society.

Conclusion: Michael Hatzakis continues to be a driving force in the world of innovation, with his passion for creating transformative solutions that push the boundaries of what is possible.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]