Location History:
- Ossining, NY (US) (1988 - 1991)
- Pleasantville, NY (US) (1988 - 1996)
Company Filing History:
Years Active: 1988-1996
Title: The Innovative Contributions of David F. Witman
Introduction
David F. Witman is a notable inventor based in Pleasantville, NY (US). He has made significant contributions to the field of technology, holding a total of 13 patents. His work primarily focuses on methods and compositions that enhance the fabrication processes in various applications.
Latest Patents
Among his latest patents is a method for fabricating a multi-layer thin film structure. This innovative method involves a process for releasing a workpiece from a substrate by utilizing a transparent substrate and a separation layer that degrades in response to specific electromagnetic radiation. Another notable patent is for a base developable negative photoresist composition. This composition includes novolak polymer, an organometallic material, and a cationic photocatalyst, making it sensitive to near U.V. radiation.
Career Highlights
David F. Witman is associated with the International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to contribute to cutting-edge technologies and advancements in the field. His innovative spirit and dedication to research have made him a valuable asset to the company.
Collaborations
Throughout his career, David has collaborated with esteemed colleagues such as Jane M. Shaw and Edward D. Babich. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies.
Conclusion
David F. Witman's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in various applications, showcasing the importance of innovation in today's world.