International Business Machines Corporation

David F Witman

Jane M Shaw

Edward D Babich

Michael Hatzakis

Jeffrey Donald Gelorme

Janusz S Wilczynski

Kevin J Stewart

Donis G Flagello

Sampath Purushothaman

Fuad Elias Doany

Chandrasekhar Narayan

Bruce Kenneth Furman

Modest M Oprysko

Alina Deutsch

Jurij R Paraszczak

Scott L Jacobs

Donald J Hunt

Gnanalingam Arjavalingam

Juri R Parasczcak

Vincent Ranieri

Stephen Renick

Bunsen Fan

Eileen Ann Galligan

Sharon L Nunes

Richard P McGouey

Russell J Serino

Raymond E Tibbetts

A method and apparatus for releasing a workpiece from a substrate including providing a substrate which is transparent to a predetermined wavelength of electromagnetic radiation; forming, on the substrate, a separation layer which degrades in response to the predetermined radiation; providing the workpiece on the separation layer; and directing the predetermined radiation at the separation layer through the transparent substrate so as to degrade the separation layer and to separate the workpiece from the substrate.

Method for fabricating multi-layer thin film structure having a

A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.

Base developable negative photoresist composition and use thereof

Multi-layer thin film structure and parallel processing method for

A composition containing an organosilicon material having terminal quinone groups, and a phenolic-novolak polymer, and use thereof in photolithography.

Alkaline developable photoresist composition containing radiation

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH.dbd.CH.sub.2 or --(--CH.sub.2 --)--.sub.n O--(--R) with R being H or ##STR2## wherein each R.sup.I, R.sup.II and R.sup.III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R.sup.IV, R.sup.V and R.sup.VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

Epoxy functional organosilicon polymer

Method for forming a pattern

Method for forming a pattern of a photoresist

Ultraviolet light sensitive photoinitiator compositions, use thereof and

Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.

Plasma-resistant polymeric material, preparation thereof, and use thereof

A system of establishing a conductive via path between spaced interlevel conductors. Successive layers of metallization separated by a dielectric are built. The vias are opened in one step to eliminate interlevel mashing. The system employs annular pads at locations where contact may be established to another wiring level. The vias are self-aligned and taper from top metal to first level contact. The system is applicable both chip-wise and carrier-wise.

Simultaneous multiple level interconnection process

A multi-layer structure that includes a transparent dielectric substrate, a layer of a nickel-containing steel alloy, and a layer of copper and/or chrome.

Multiple density mask and fabrication thereof

A coherent laser beam having a possibly non-uniform spatial intensity distribution is transformed into an incoherent light beam having a substantially uniform spatial intensity distribution by homogenizing the laser beam with a light tunnel (a transparent light passageway having flat internally reflective side surfaces). It has been determined that when the cross-section of the tunnel is a polygon (as preferred) and the sides of the tunnel are all parallel to the axis of the tunnel (as preferred), the laser light at the exit of the light tunnel (or alternatively at any image plane with respect thereto) will have a substantially uniform intensity distribution and will be incoherent only when the aspect ratio of the tunnel (length divided by width) equals or exceeds the contangent of the input beam divergence angle .theta. and when

Laser beam homogenizer

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Pleasantville, NY, United States of America

David F Witman