The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2026
Filed:
Jun. 21, 2023
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Chuan-Cheng Tsou, Tainan City, TW;
Sung-Hsin Yang, Tainan, TW;
Jung-Chi Jeng, Hsinchu, TW;
Chen-Chieh Chiang, Kaohsiung City, TW;
Ru-Shang Hsiao, Hsinchu, TW;
Ling-Sung Wang, Tainan City, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
Embodiments of the present disclosure relate to methods for forming a film stack during fabrication or bonding process. The film stack according to present disclosure may reduce wet dip attacking to semiconductor substrate during bonding, such as bonding between an image sensor substrate and a logic device substrate. The film stack according to the present disclosure may be used to modulate stress and wafer warpage to improve bonding adhesion and device performance during various packaging schemes, such as CoWoS, SoIC, or the like. The film stack according to the present disclosure may be used to improve bonding process and device performance in both wafer-to-wafer bonding and die-to-die bonding.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile