The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Mar. 24, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Min-Yu Chen, Kaohsiung City, TW;

PO-Chen Lai, Hsinchu, TW;

Ming-Chih Yew, Hsinchu City, TW;

Shin-Puu Jeng, Po-Shan Village, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/538 (2006.01); H10B 80/00 (2023.01); H10W 70/05 (2026.01); H10W 70/60 (2026.01); H10W 70/63 (2026.01); H10W 70/65 (2026.01); H10W 72/00 (2026.01); H10W 90/00 (2026.01); H10P 72/70 (2026.01); H10W 72/20 (2026.01); H10W 74/15 (2026.01);
U.S. Cl.
CPC ...
H10W 70/65 (2026.01); H10B 80/00 (2023.02); H10W 70/093 (2026.01); H10W 70/095 (2026.01); H10W 70/611 (2026.01); H10W 70/635 (2026.01); H10W 72/072 (2026.01); H10W 90/00 (2026.01); H10W 90/401 (2026.01); H10P 72/74 (2026.01); H10P 72/7424 (2026.01); H10W 72/07236 (2026.01); H10W 72/073 (2026.01); H10W 72/241 (2026.01); H10W 74/15 (2026.01); H10W 90/724 (2026.01); H10W 90/734 (2026.01);
Abstract

A composite interposer includes a local-silicon-interconnect-containing (LSI-containing) interposer that includes a local silicon interconnect (LSI) bridge; and an organic interposer located on the LSI-containing interposer, including redistribution dielectric layers embedding redistribution wiring interconnects and a metallic counter-deformation structure. The metallic counter-deformation structure includes a plurality of metallic via structures; a first metallic plate located on a first side of the plurality of metallic via structures; and a second metallic plate located on a second side of the plurality metallic via structures and vertically spaced from the first metallic plate.


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