The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Jul. 24, 2024
Chengdu University of Technology, Chengdu, CN;
Kesai Li, Chengdu, CN;
Jiaqi Sun, Chengdu, CN;
Hucheng Deng, Chengdu, CN;
Xianhong He, Chengdu, CN;
Zehou Xiang, Chengdu, CN;
Hangjie Lin, Chengdu, CN;
Yanjun Liu, Chengdu, CN;
Jianhua He, Chengdu, CN;
Yan Liu, Chengdu, CN;
Kaicheng Lei, Chengdu, CN;
Shuoshuo Zhan, Chengdu, CN;
Hong Li, Chengdu, CN;
Chengdu University of Technology, Chengdu, CN;
Abstract
Disclosed is an invasion correction method and system for resistivity logging. The method includes the steps of: analyzing mud filtrate invasion features based on an actual resistivity logging curve; determining an invasion mechanism, and performing forward modeling on a resistivity logging response; performing inversion by a random forest method to form a correction chart; and outputting a formation resistivity to finally form the invasion correction method and system for resistivity logging. In the present disclosure, double lateral correction under an invasion condition is accomplished, while a chart method and an inversion method are combined, ensuring the accuracy and operating rate of correction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile