This inventor holds 1 USPTO granted patent. Top assignee: Chengdu University of Technology. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Hangjie Lin: Resistivity Logging Innovation
Introduction
Hangjie Lin is an inventor based in Chengdu, China, associated with Chengdu University of Technology. His patent work addresses the correction of resistivity logging measurements affected by mud filtrate invasion.
Latest Patents
Lin is associated with 1 patent: “Invasion Correction Method and System for Resistivity Logging.” The disclosed method analyzes mud filtrate invasion features using an actual resistivity logging curve, identifies the invasion mechanism, and models the logging response. It then applies a random forest method to perform inversion and create a correction chart before outputting formation resistivity. By combining chart-based and inversion approaches, the method aims to improve the accuracy and speed of double lateral correction under invasion conditions.
Career Highlights
Lin’s patent reflects an application of computational modeling and machine learning to resistivity logging. The approach is designed to correct measurements affected by invasion and support more reliable formation resistivity estimates.
Collaborations
Lin’s listed coworkers include Kesai Li and Jiaqi Sun. His work is associated with Chengdu University of Technology.
Conclusion
Hangjie Lin’s patent combines invasion analysis, forward modeling, and random forest inversion to advance resistivity logging correction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile