Kaicheng Lei

Title: Kaicheng Lei and Resistivity Logging Innovation.

Introduction

Kaicheng Lei is an inventor based in Chengdu, China, and is associated with Chengdu University of Technology. His patent work addresses the interpretation and correction of resistivity logging measurements under mud filtrate invasion conditions.

Latest Patents

The provided information identifies one patent associated with Lei: “Invasion Correction Method and System for Resistivity Logging.” The invention analyzes mud filtrate invasion features using an actual resistivity logging curve, determines the invasion mechanism, and models the resistivity logging response. It then applies a random forest method to perform inversion and create a correction chart, ultimately producing a formation resistivity result. By combining chart-based and inversion methods, the approach aims to improve the accuracy and speed of double lateral correction under invasion conditions. Lei is credited with 1 patent in the information provided.

Career Highlights

Lei’s listed patent focuses on a technical challenge in resistivity logging: correcting measurements affected by invasion. The method brings together analysis of logging data, forward modeling, and random forest inversion to support the correction process. His association with Chengdu University of Technology connects this work to an academic institution.

Collaborations

The provided information lists Kesai Li and Jiaqi Sun as Lei’s coworkers. No further details about their roles or contributions to the patent are specified.

Conclusion

Kaicheng Lei’s documented invention combines resistivity logging analysis, modeling, and random forest inversion to address invasion-related measurement correction. The patent reflects a focused contribution to improving the accuracy and operating speed of formation resistivity evaluation.