The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Mar. 25, 2024
Kla Corporation, Milpitas, CA (US);
Itay Gdor, Tel-Aviv, IL;
Yuval Lubashevsky, Haifa, IL;
Vladimir Levinski, Migdal HaEmek, IL;
Daria Negri, Nesher, IL;
Nickolai Isakovitch, Tel-Aviv, IL;
KLA Corporation, Milpitas, CA (US);
Abstract
A method includes illuminating an overlay target with a plurality of measurement cells. The method further includes receiving time-varying interference signals from a first and second photodetector as an overlay target is scanned along a stage-scan direction by a translation stage when implementing a metrology recipe. The overlay target may include a plurality of measurement cells, where each measurement cell includes a grating-over-grating structures including a first-layer grating feature on a first layer of the sample and a second-layer grating feature on a second layer of the sample in an overlapping region. The first-layer grating feature and the second-layer grating feature may have a similar pitch. The method includes determining one or more differential signals between the first photodetector and the second photodetector for each measurement cell of the plurality of measurement cells. The method includes determining an overlay measurement based on the determined one or more differential signals.