The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Sep. 25, 2023
Kla Corporation, Milpitas, CA (US);
Itay Gdor, Tel-Aviv, IL;
Yonatan Vaknin, Yoqneam Llit, IL;
Nireekshan K. Reddy, Tel Aviv, IL;
Alon Alexander Volfman, Tel-Aviv, IL;
Iftach Galon, Tel-Aviv, IL;
Jordan Pio, Milpitas, CA (US);
Yuval Lubashevsky, Haifa, IL;
Nickolai Isakovitch, Tel-Aviv, IL;
Andrew V. Hill, Sunriver, OR (US);
Oren Lahav, Tel-Aviv, IL;
Daria Negri, Nesher, IL;
Vladimir Levinski, Migdal HaEmek, IL;
KLA Corporation, Milpitas, CA (US);
Abstract
A method may include receiving time-varying interference signals from two or more photodetectors associated with a first exposure structure and a second exposure structure in one or more cells as an overlay target is scanned in accordance with a metrology recipe, where the first exposure structure and the second exposure structure form a side-by-side grating, where the side-by-side grating includes one or more diffraction gratings, where at least one diffraction grating is a non-overlapping side-by-side grating, where the first exposure structure is arranged adjacent to the second exposure structure, where the side-by-side grating is periodic along the scan direction. The method may further include determining an overlay error between one of the first exposure structure and the second exposure structure of the sample based on the time-varying interference signals, where the time-varying interference signals corresponding to the non-overlapping first exposure structure and second exposure structure are synchronized.