The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2026

Filed:

Oct. 23, 2022
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Yuichi Harada, Matsumoto-city, JP;

Seiji Noguchi, Matsumoto-city, JP;

Norihiro Komiyama, Matsumoto-city, JP;

Yoshihiro Ikura, Matsumoto-city, JP;

Yosuke Sakurai, Azumino-city, JP;

Yoshihisa Suzuki, Matsumoto-city, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 62/13 (2025.01); H10D 8/00 (2025.01); H10D 12/00 (2025.01); H10D 62/53 (2025.01); H10D 84/60 (2025.01); H10P 32/10 (2026.01);
U.S. Cl.
CPC ...
H10D 62/142 (2025.01); H10D 8/422 (2025.01); H10D 12/481 (2025.01); H10D 62/53 (2025.01); H10D 84/617 (2025.01); H10P 32/171 (2026.01); H10P 32/18 (2026.01);
Abstract

Provided is a semiconductor device including: a semiconductor substrate having a drift region of a first conductivity type; and a buffer region of the first conductivity type provided between the drift region and a lower surface of the semiconductor substrate and having a higher doping concentration than the drift region. The buffer region has two or more helium chemical concentration peaks arranged at different positions in a depth direction of the semiconductor substrate.


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