The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Sep. 27, 2023
Applied Materials, Inc., Santa Clara, CA (US);
Michael Prestoza Decena, Sunnyvale, CA (US);
Tsu-Hui Yang, Dongkung Town, TW;
Sridhar K. N., Bangalore, IN;
Parthiban Balakrishnan, Bangalore, IN;
Yuan Ling, Hsinchu City, TW;
Sylvia Sun, Hsinchu City, TW;
Simpson Wen, Hsinchu City, TW;
Chih An Chang, Taoyuan City, TW;
Tk Wang, Hsinchu City, TW;
Chao-Jian Huang, Tainan City, TW;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The disclosure provides an apparatus for substrate polishing, the apparatus includes a housing member, a carrier member, and a distal force assembly. The carrier member is coupled to and disposed radially outward of the housing member. The distal force assembly disposed radially inward of an exterior portion of the carrier member and radially outward of the housing member. The distal force assembly includes a bladder seal, a seal ring in contact with the bladder seal. The seal ring has a seal ring face and one or more grooves disposed therein. The grooves include a plateau radius and a ridge radius disposed opposite the plateau radius at an intersection between the seal ring face and the grooves, wherein the plateau radius and the ridge radius are between about 0.012 to about 0.018 inches. The distal force assembly also includes a transfer ring coupled to the seal ring opposite the bladder.