Hsinchu, Taiwan

Yuan Ling

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuan Ling. Retrieved from https://idiyas.com/inventor/yuan-ling-2snqe4hx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Yuan Ling in Substrate Polishing Technology

Introduction

Yuan Ling is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of substrate polishing technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency and effectiveness of polishing processes in various applications.

Latest Patents

Yuan Ling holds a patent for a CMP inner ring in a smart head. The patent describes an apparatus for substrate polishing that includes a housing member, a carrier member, and a distal force assembly. The carrier member is coupled to and disposed radially outward of the housing member. The distal force assembly is positioned radially inward of an exterior portion of the carrier member and radially outward of the housing member. This assembly features a bladder seal and a seal ring that contacts the bladder seal. The seal ring has a face and includes one or more grooves with specific dimensions. The grooves are designed with a plateau radius and a ridge radius, which are crucial for the polishing process. The dimensions of these radii range from about 0.012 to about 0.018 inches. Additionally, the distal force assembly includes a transfer ring that is coupled to the seal ring opposite the bladder.

Career Highlights

Yuan Ling is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His role involves developing advanced technologies that improve substrate polishing processes. His innovative approach has contributed to the company's reputation for excellence in manufacturing equipment.

Collaborations

Yuan Ling collaborates with Tsu-Hui Yang, a fellow innovator in the field. Together, they work on projects that aim to push the boundaries of substrate polishing technology.

Conclusion

Yuan Ling's contributions to substrate polishing technology through his patent demonstrate his innovative spirit and commitment to advancing the industry. His work at Applied Materials, Inc. continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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