The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Jul. 29, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Ting-Ting Kuo, Hsinchu City, TW;

Li-Hsien Huang, Zhubei City, TW;

Tien-Chung Yang, Hsinchu City, TW;

Yao-Chun Chuang, Hsinchu City, TW;

Yinlung Lu, Hsinchu, TW;

Jun He, Zhubei City, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10W 70/65 (2026.01); H10W 70/05 (2026.01); H10W 70/69 (2026.01); H10W 70/695 (2026.01); H10W 74/00 (2026.01); H10W 74/10 (2026.01); H10W 74/15 (2026.01); H10W 74/40 (2026.01); H10W 90/00 (2026.01);
U.S. Cl.
CPC ...
H10W 70/65 (2026.01); H10W 70/095 (2026.01); H10W 70/69 (2026.01); H10W 70/695 (2026.01); H10W 90/00 (2026.01); H10W 74/00 (2026.01); H10W 74/127 (2026.01); H10W 74/15 (2026.01); H10W 74/40 (2026.01); H10W 90/401 (2026.01); H10W 90/701 (2026.01); H10W 90/724 (2026.01); H10W 90/734 (2026.01); H10W 90/794 (2026.01);
Abstract

An adhesion layer may be formed over portions of a redistribution layer (RDL) in a redistribution structure of a semiconductor device package. The portions of the RDL over which the adhesion layer is formed may be located in the 'shadow' of (e.g., the areas under and/or over and within the perimeter of) one or more through insulator layers (TIVs) that are connected with the redistribution layer structure. The adhesion layer, along with a seed layer on which the portions of the RDL are formed, encapsulate the portions of the RDL in the shadow of the one or more TIVs, which promotes and/or increases adhesion between the portions of the RDL and the polymer layers of the redistribution structure.


Find Patent Forward Citations

Loading…