The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
May. 07, 2024
International Business Machines Corporation, Armonk, NY (US);
Monali Naresh Basutkar, Danbury, CT (US);
Christopher Muzzy, Burlington, VT (US);
Steven Paul Ostrander, Poughkeepsie, NY (US);
Thomas Weiss, Poughkeepsie, NY (US);
Thomas Anthony Wassick, LaGrangeville, NY (US);
Brian W. Quinlan, Poughkeepsie, NY (US);
Kurt Alan Smith, Pleasant Valley, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A top-down inspection system and method employs a strategy using specific geometric shaped metal alignment markers on a semiconductor die and a laminate that can be inspected using an IR camera. The metal alignment markers will align at room temperature to assess the die alignment prior to reflowing it. As silicon is transparent to IR wavelengths the system allows for the IR light to pass through the die to the laminate to see alignment features on the die and the laminate concurrently. The specific markers are placed in at least two separate locations preferably >0.5*die size apart. The robust alignment markers are substantially resistant to degradation caused by semiconductor device fabrication steps. The metal alignment markers can be small geometrical shapes to provide a more symmetrical signal which is more resistant to variability in prior processing steps than the standard marker design.