The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Jul. 18, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Heesuk Woo, Suwon-si, KR;
Kyusang Ahn, Iksan-si, KR;
Jung-Min Oh, Suwon-si, KR;
Jiwon Kim, Iksan-si, KR;
Jinkyu Roh, Iksan-si, KR;
Hyojoong Yoon, Iksan-si, KR;
Sang Won Bae, Suwon-si, KR;
Kyungmo Sung, Suwon-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
DONGWOO FINE-CHEM CO., LTD., Jeollabuk-do, KR;
Abstract
The present disclosure relates to an etchant composition for etching silicon and silicon germanium, and/or a preparation method of a pattern using the etchant composition. The etchant composition may include an oxidizing agent, a fluorine-based compound, a surfactant represented by Chemical Formula 1 or 2, and water. The etchant composition may include the surfactant in an amount of 5% to 40% by weight based on 100% by weight of the etchant composition.