This inventor holds 1 USPTO granted patent. Top assignees: Dongwoo Fine-Chem, Samsung Electronics Ltd.. Active years: 2026.
Company Filing History:
1 out of 25 
1 out of 5,708 Years Active: 2026
Title: Kyusang Ahn - Innovator in Etchant Composition
Introduction
Kyusang Ahn is an inventor based in Iksan-si, South Korea. He has made contributions to the field of etching compositions, particularly for silicon and silicon germanium. His innovative approach focuses on developing effective etchant compositions that can enhance the etching process.
Latest Patent Applications
Kyusang Ahn's notable patent application is titled "ETCHANT COMPOSITION FOR ETCHING SILICON AND SILICON GERMANIUM, AND PREPARATION METHOD OF PATTERN USING THE SAME." This application describes an etchant composition that includes an oxidizing agent, a fluorine-based compound, a surfactant represented by specific chemical formulas, and water. The surfactant is included in an amount ranging from 5% to 40% by weight based on the total weight of the etchant composition. This innovative formulation aims to improve the efficiency and effectiveness of etching processes in semiconductor manufacturing.
Conclusion
Kyusang Ahn's work in developing etchant compositions showcases his commitment to advancing technology in the semiconductor industry. His contributions, although not yet resulting in granted patents, reflect a significant potential for innovation in this field.