This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Dongwoo Fine-Chem, Samsung Electronics Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 28 
1 out of 6,229 Years Active: 2026
Title: Heesuk Woo - Innovator in Etchant Composition
Introduction
Heesuk Woo is an inventor based in Suwon-si, South Korea. He has made contributions to the field of etching technology, particularly focusing on silicon and silicon germanium. His innovative approach aims to enhance the efficiency and effectiveness of etching processes.
Latest Patent Applications
Heesuk Woo's notable patent application is titled "Etchant Composition for Etching Silicon and Silicon Germanium, and Preparation Method of Pattern Using the Same." This application describes an etchant composition that includes an oxidizing agent, a fluorine-based compound, a surfactant represented by Chemical Formula 1 or 2, and water. The surfactant is included in an amount of 5% to 40% by weight based on 100% by weight of the etchant composition. This formulation aims to improve the etching process for silicon and silicon germanium materials.
Conclusion
Heesuk Woo's work in developing etchant compositions showcases his commitment to advancing technology in the semiconductor industry. His innovative applications have the potential to significantly impact the efficiency of etching processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile